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UV EQUIPMENT
UV-Curing in Inert system
Applications: coating, siliconisation, printing
Residual oxygen content: up to 20 ppm
UV lamps: number, width and output of the UV lamps depend on the specific application
UV monitoring: optional online monitoring
Inertisation: N2 with optional residu
Residual oxygen content: up to 20 ppm
UV lamps: number, width and output of the UV lamps depend on the specific application
UV monitoring: optional online monitoring
Inertisation: N2 with optional residu
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